Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO 4 Precursor

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Bibliographic Details
Published inChemistry of materials Vol. 21; no. 2; pp. 207 - 209
Main Authors Han, Jeong Hwan, Lee, Sang Woon, Choi, Gyu-Jin, Lee, Sang Young, Hwang, Cheol Seong, Dussarrat, Christian, Gatineau, Julien
Format Journal Article
LanguageEnglish
Published 27.01.2009
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ISSN:0897-4756
1520-5002
DOI:10.1021/cm802485r