Effects of Postdeposition Annealing on the Characteristics of HfO[sub x]N[sub y] Dielectrics on Germanium and Silicon Substrates
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Published in | Journal of the Electrochemical Society Vol. 153; no. 7; p. F160 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
2006
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Online Access | Get full text |
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ISSN: | 0013-4651 |
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DOI: | 10.1149/1.2203097 |