Influence of the thickness of a SiO 2 reflective layer on the performance of a structured CsI(Tl) scintillation screen based on an oxidized Si micropore array template in X-ray imaging
To obtain better light guidance and optical isolation effects under a limited microcolumn wall thickness, the influence of the thickness of a SiO 2 reflective layer on the performance of a structured CsI(Tl) scintillation screen based on an oxidized Si micropore array template in X-ray imaging was s...
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Published in | Optics express Vol. 30; no. 12; p. 21324 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
06.06.2022
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Online Access | Get full text |
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Summary: | To obtain better light guidance and optical isolation effects under a limited microcolumn wall thickness, the influence of the thickness of a SiO 2 reflective layer on the performance of a structured CsI(Tl) scintillation screen based on an oxidized Si micropore array template in X-ray imaging was simulated. The results show that the SiO 2 reflective layer should maintain a certain thickness to achieve good light-guide performance. However, if the template is entirely composed of SiO 2 , the light isolation performance of the microcolumn wall will be slightly worse. The results provide a basis for optimizing the thickness of SiO 2 reflective layer. |
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ISSN: | 1094-4087 1094-4087 |
DOI: | 10.1364/OE.459637 |