Influence of the thickness of a SiO 2 reflective layer on the performance of a structured CsI(Tl) scintillation screen based on an oxidized Si micropore array template in X-ray imaging

To obtain better light guidance and optical isolation effects under a limited microcolumn wall thickness, the influence of the thickness of a SiO 2 reflective layer on the performance of a structured CsI(Tl) scintillation screen based on an oxidized Si micropore array template in X-ray imaging was s...

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Bibliographic Details
Published inOptics express Vol. 30; no. 12; p. 21324
Main Authors Sun, Zhixiang, Gu, Mu, Teng, Yunxue, Liu, Xiaolin, Liu, Bo, Zhang, Juannan, Huang, Shiming, Ni, Chen
Format Journal Article
LanguageEnglish
Published 06.06.2022
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Summary:To obtain better light guidance and optical isolation effects under a limited microcolumn wall thickness, the influence of the thickness of a SiO 2 reflective layer on the performance of a structured CsI(Tl) scintillation screen based on an oxidized Si micropore array template in X-ray imaging was simulated. The results show that the SiO 2 reflective layer should maintain a certain thickness to achieve good light-guide performance. However, if the template is entirely composed of SiO 2 , the light isolation performance of the microcolumn wall will be slightly worse. The results provide a basis for optimizing the thickness of SiO 2 reflective layer.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.459637