Patterning of Narrow Au Nanocluster Lines Using V 2 O 5 Nanowire Masks and Ion-Beam Milling

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Bibliographic Details
Published inNano letters Vol. 3; no. 2; pp. 135 - 138
Main Authors Ancona, M. G., Kooi, S. E., Kruppa, W., Snow, A. W., Foos, E. E., Whitman, L. J., Park, D., Shirey, L.
Format Journal Article
LanguageEnglish
Published 01.02.2003
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ISSN:1530-6984
1530-6992
DOI:10.1021/nl0258224