InSb薄膜磁阻效应的厚度依赖性
O472%O484; 在12 ~300 K的温度范围内研究了InSb薄膜(利用MBE生长)的磁阻效应随厚度的变化关系.实验发现厚的InSb薄膜只能产生半经典(oB2)磁阻效应.而减小薄膜厚度,在薄的InSb薄膜中会更容易出现弱反局域化效应,从而造成在低温下(<35 K)出现了一个异常的随温度增加而迁移率降低的趋势.我们发现该弱反局域化效应可用HLN模型拟合,证明了它可能来源于二维(2-D)体系,比如InSb的界面态....
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Published in | 红外与毫米波学报 Vol. 36; no. 3; pp. 311 - 315 |
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Main Author | |
Format | Journal Article |
Language | Chinese |
Published |
上海理工大学材料科学与工程学院,上海200093
2017
华东师范大学极化材料与器件教育部重点实验室,上海200062%中国科学院上海技术物理研究所红外物理国家重点实验室,上海,200083%上海理工大学材料科学与工程学院,上海,200093 中国科学院上海技术物理研究所红外物理国家重点实验室,上海200083%中国科学院上海技术物理研究所红外物理国家重点实验室,上海200083 |
Subjects | |
Online Access | Get full text |
ISSN | 1001-9014 |
DOI | 10.11972/j.issn.1001-9014.2017.03.011 |
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Summary: | O472%O484; 在12 ~300 K的温度范围内研究了InSb薄膜(利用MBE生长)的磁阻效应随厚度的变化关系.实验发现厚的InSb薄膜只能产生半经典(oB2)磁阻效应.而减小薄膜厚度,在薄的InSb薄膜中会更容易出现弱反局域化效应,从而造成在低温下(<35 K)出现了一个异常的随温度增加而迁移率降低的趋势.我们发现该弱反局域化效应可用HLN模型拟合,证明了它可能来源于二维(2-D)体系,比如InSb的界面态. |
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Bibliography: | InSb, magnetoresistance, weak antilocalization effect, surface/interface states We experimentally investigated the thickness-dependent magnetoresistance properties of InSb films in the temperature range of 12 x 300 K. The samples were grown on semi-insulating GaAs (100) substrates by molecular beam epitaxy (MBE). It was observed that the thick InSb only can show the semi-classical B2 dependence magnetoresistance resulted from the Lorentz deflection of carriers. At the same time, we found that weak antilocalization (WAL) effect can be much enhanced by reducing the sample' s thickness ( with the thickness N 0.1 p,m). The thin sample' s WAL magnetoresistance plot can be well fitted by Hikan-Larkin-Nagaoka (HLN) model, which demonstrates that the obseved WAL effect for thin InSb is with a 2-dimension character, which can be associated with the surface/interface states of InSb. 31-1577/TN ZHANG Yu-Hui1'2, SONG Zhi-Yong2'3, CHEN Ping-Ping2, LIN Tie2, TIAN Feng1 , KANG Ting-Ting2. ( 1. School of Mate.rials Science and |
ISSN: | 1001-9014 |
DOI: | 10.11972/j.issn.1001-9014.2017.03.011 |