Fast growth of large-grain and continuous MoS2 films through a self-capping vapor-liquid-solid method
Most chemical vapor deposition methods for transition metal dichalcogenides use an extremely small amount of precursor to render large single-crystal flakes, which usually causes low coverage of the materials on the substrate. In this study, a self-capping vapor-liquid-solid reaction is proposed to...
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Published in | Nature communications Vol. 11; no. 1; pp. 3682 - 9 |
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Main Authors | , , , , , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
London
Nature Publishing Group UK
23.07.2020
Nature Publishing Group Nature Portfolio |
Subjects | |
Online Access | Get full text |
ISSN | 2041-1723 2041-1723 |
DOI | 10.1038/s41467-020-17517-6 |
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Summary: | Most chemical vapor deposition methods for transition metal dichalcogenides use an extremely small amount of precursor to render large single-crystal flakes, which usually causes low coverage of the materials on the substrate. In this study, a self-capping vapor-liquid-solid reaction is proposed to fabricate large-grain, continuous MoS
2
films. An intermediate liquid phase-Na
2
Mo
2
O
7
is formed through a eutectic reaction of MoO
3
and NaF, followed by being sulfurized into MoS
2
. The as-formed MoS
2
seeds function as a capping layer that reduces the nucleation density and promotes lateral growth. By tuning the driving force of the reaction, large mono/bilayer (1.1 mm/200 μm) flakes or full-coverage films (with a record-high average grain size of 450 μm) can be grown on centimeter-scale substrates. The field-effect transistors fabricated from the full-coverage films show high mobility (33 and 49 cm
2
V
−1
s
−1
for the mono and bilayer regions) and on/off ratio (1 ~ 5 × 10
8
) across a 1.5 cm × 1.5 cm region.
Here, the authors develop a self-capping vapour-liquid-solid reaction to fabricate large-grain continuous MoS
2
films, whereby an intermediate liquid phase-Na
2
Mo
2
O
7
is formed through a eutectic reaction of MoO
3
and NaF, followed by sulphurisation into MoS
2
. |
---|---|
Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 content type line 23 |
ISSN: | 2041-1723 2041-1723 |
DOI: | 10.1038/s41467-020-17517-6 |