Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe

• Published in: Sensors (Basel, Switzerland) Vol. 22; no. 3; p. 1291
• Main Authors: Kim, Si-Jun, Lee, Jang-Jae, Lee, Young-Seok, Cho, Chul-Hee, You, Shin-Jae
• Format: Journal Article
• Language: English
• Published: Switzerland MDPI AG 08.02.2022; MDPI
• Subjects: Boundary conditions; Chemical reactions; Chemical vapor deposition; Computer simulation; crossing frequency method; cutoff probe; Electromagnetic radiation; Electron density; electron density measurement; High pressure; high-pressure plasma; Lasers; Low pressure; Methods; Plasma diagnostics; Plasma etching; Radiation; South Korea; electron density measurement; crossing frequency method; cutoff probe; plasma diagnostics; high-pressure plasma
• ISSN: 1424-8220; 1424-8220
• DOI: 10.3390/s22031291

Although the recently developed cutoff probe is a promising tool to precisely infer plasma electron density by measuring the cutoff frequency (fcutoff) in the S21 spectrum, it is currently only applicable to low-pressure plasma diagnostics below several torr. To improve the cutoff probe, this paper proposes a novel method to measure the crossing frequency (fcross), which is applicable to high-pressure plasma diagnostics where the conventional fcutoff method does not operate. Here, fcross is the frequency where the S21 spectra in vacuum and plasma conditions cross each other. This paper demonstrates the fcross method through three-dimensional electromagnetic wave simulation as well as experiments in a capacitively coupled plasma source. Results demonstrate that the method operates well at high pressure (several tens of torr) as well as low pressure. In addition, through circuit model analysis, a method to estimate electron density from fcross is discussed. It is believed that the proposed method expands the operating range of the cutoff probe and thus contributes to its further development.