Next Generation Photosensitive Dielectric Materials for Advanced Packaging Applications

Hitachi Chemical DuPont MicroSystems (HDMS) is a supplier of photosensitive negative-tone polyimides (PI) and positive-tone poly(benzoxazole)s (PBO) for use as protection layers in semiconductor ICs or as dielectrics for re-distribution layers in Fan-in or Fan-out wafer level packages. These materia...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 31; no. 4; pp. 451 - 456
Main Authors Motobe, Takeharu, Ohe, Masayuki, Yamazaki, Noriyuki, Enomoto, Tetsuya
Format Journal Article
LanguageEnglish
Japanese
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 25.06.2018
Japan Science and Technology Agency
Subjects
Adhesion to Cu
Design
Dielectrics
Electronic packaging
High modulus
High resolution
Insulation
Insulation reliability
Integrated circuits
Low stress
Low temperature curable
Organic chemistry
Packaging
Photosensitive PI and PBO
Photosensitivity
Polyimide resins
Properties (attributes)
Protective coatings
Warpage
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Summary:Hitachi Chemical DuPont MicroSystems (HDMS) is a supplier of photosensitive negative-tone polyimides (PI) and positive-tone poly(benzoxazole)s (PBO) for use as protection layers in semiconductor ICs or as dielectrics for re-distribution layers in Fan-in or Fan-out wafer level packages. These materials offer an easy manufacturing process as well as ensuring high reliability in semiconductor packages. Recently, design rules and structures for next generation packages are advancing in order to achieve higher end multi-functionality. In accordance with this trend, next generation PIs and PBOs need to be developed to address new challenges that include lithographic properties, in-process compatibility and end-use properties and, in this paper, the latest material sets developed by HDMS will be introduced for advanced packaging applications. The 1st material set is a low stress photosensitive PI designed especially as a protection layer in advanced process node semiconductor ICs where warpage reduction and better protection capability for fragile low-k layers are needed. The 2nd and 3rd material sets are designed as low temperature curable photosensitive PI and PBO for use as dielectrics in Fan-out wafer level package to provide good applicability with future device designs as well as high package reliability by improving resolution, cured film properties, adhesion, insulation reliability, and others.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.31.451