原子氧对石墨烯膜电阻的影响
通过对石墨烯膜在原子氧辐照下电阻变化研究,并结合原子氧辐照前后石墨烯膜表面微观形貌分析,发现石墨烯膜会被原子氧剥蚀,膜厚逐渐减小直至完全剥蚀。石墨烯膜的电阻在原子氧辐照初期有所下降,之后开始上升。说明在原子氧辐照初期有石墨烯吸附氧原子的现象,在后期石墨烯膜电性能变化符合电阻定律。利用石墨烯剥蚀厚度或者石墨烯电阻变化数据两种方法都可以得到石墨烯膜剥蚀率,约为(1.2-1.3)×10-25cm3/atom。根据石墨烯膜电阻随原子氧注量的关系,提出一种新的原子氧探测器。...
Saved in:
Published in | 材料工程 Vol. 45; no. 8; pp. 9 - 13 |
---|---|
Main Author | |
Format | Journal Article |
Language | Chinese |
Published |
北京卫星环境工程研究所,北京,100094
2017
|
Subjects | |
Online Access | Get full text |
ISSN | 1001-4381 1001-4381 |
DOI | 10.11868/j.issn.1001-4381.2015.001348 |
Cover
Summary: | 通过对石墨烯膜在原子氧辐照下电阻变化研究,并结合原子氧辐照前后石墨烯膜表面微观形貌分析,发现石墨烯膜会被原子氧剥蚀,膜厚逐渐减小直至完全剥蚀。石墨烯膜的电阻在原子氧辐照初期有所下降,之后开始上升。说明在原子氧辐照初期有石墨烯吸附氧原子的现象,在后期石墨烯膜电性能变化符合电阻定律。利用石墨烯剥蚀厚度或者石墨烯电阻变化数据两种方法都可以得到石墨烯膜剥蚀率,约为(1.2-1.3)×10-25cm3/atom。根据石墨烯膜电阻随原子氧注量的关系,提出一种新的原子氧探测器。 |
---|---|
Bibliography: | 11-1800/TB LIU Yu-ming,LI Man, LIU Xiang-peng,ZHANG Kai,ZHAO Chun-qing (Beijing Institute of Spacecraft Environment Engineering,Beijing 100094, China) graphene;atomic oxygen; erosion rate; atomic oxygen detection The resistance and the surface morphology of the graphene films were studied after atomic oxygen exposure. The graphene films can be etched away during atomic oxygen exposure, the resist-ance of graphene films decreases at first and then increases. It shows that the adsorption of oxygen at-om may play an important role in the change of the resistance of graphene films at the beginning of the exposure and then the change of the resistance conforms to the law of resistance. The atomic oxygen erosion rate which is about 1. 2 X 10-25 cm3 /atom to 1. 3 X 10-25 cm3 /atom can be obtained. A kind of new atomic oxygen detector was put forward based on the relationship between the resistance of gra-phene films and atomic oxygen fluence. |
ISSN: | 1001-4381 1001-4381 |
DOI: | 10.11868/j.issn.1001-4381.2015.001348 |