Hydrophobic Surface Construction by Phase-Separation of Fluorinated Block Copolymer for Immersion Lithography

Newly designed topcoat-less resist for immersion lithography is described. Hydrophobic resist surface layer was constructed successfully in order to solve problems regarding immersion resist and improve lithographic performance. Fluorinated diblock copolymer synthesized via atom transfer radical pol...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 21; no. 5; pp. 679 - 684
Main Authors Otake, Atsushi, Miura, Masashi, Tsuchiya, Kousuke, Ogino, Kenji
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 01.01.2008
Japan Science and Technology Agency
Subjects
Block Copolymer
Construction
Copolymers
Fluorination
Hydrophobicity
Immersion
immersion lithography
Lithography
Phase-Separation
Resists
Self assembly
topcoat-less resist
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Summary:Newly designed topcoat-less resist for immersion lithography is described. Hydrophobic resist surface layer was constructed successfully in order to solve problems regarding immersion resist and improve lithographic performance. Fluorinated diblock copolymer synthesized via atom transfer radical polymerization (ATRP) showed self-assembly surface segregation in resist films. In spite of low fluorine composition, hydrophobicity of the resist surface was remarkably enhanced. Newly designed topcoat-less resist is expected to be utilized in immersion lithography.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.21.679