Increased Heschl's Gyrus Duplication in Schizophrenia Spectrum Disorders: A Cross-Sectional MRI Study

Duplicated Heschl's gyrus (HG) is prevalent in patients with schizophrenia and may reflect early neurodevelopmental anomalies. However, it currently remains unclear whether patients with schizotypal disorder, a prototypic disorder within the schizophrenia spectrum, exhibit a similar HG gyrifica...

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Published inJournal of personalized medicine Vol. 11; no. 1; p. 40
Main Authors Takahashi, Tsutomu, Sasabayashi, Daiki, Takayanagi, Yoichiro, Furuichi, Atsushi, Kido, Mikio, Pham, Tien Viet, Kobayashi, Haruko, Noguchi, Kyo, Suzuki, Michio
Format Journal Article
LanguageEnglish
Published Switzerland MDPI AG 12.01.2021
MDPI
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Summary:Duplicated Heschl's gyrus (HG) is prevalent in patients with schizophrenia and may reflect early neurodevelopmental anomalies. However, it currently remains unclear whether patients with schizotypal disorder, a prototypic disorder within the schizophrenia spectrum, exhibit a similar HG gyrification pattern. In this magnetic resonance imaging study, HG gyrification patterns were examined in 47 patients with schizotypal disorder, 111 with schizophrenia, and 88 age- and sex-matched healthy subjects. HG gyrification patterns were classified as single, common stem duplication (CSD), or complete posterior duplication (CPD). The prevalence of the duplicated HG patterns (CSD or CPD) bilaterally was higher in the schizophrenia and schizotypal groups than in healthy controls, whereas no significant difference was observed between the schizophrenia and schizotypal groups. Schizophrenia patients with the right CPD pattern had less severe positive symptoms, whereas the right single HG pattern was associated with higher doses of antipsychotic medication in schizotypal patients. The present study demonstrated shared HG gyrification patterns in schizophrenia spectrum disorders, which may reflect a common biological vulnerability factor. HG patterns may also be associated with susceptibility to psychopathology.
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ISSN:2075-4426
2075-4426
DOI:10.3390/jpm11010040