Strain-Tunable Electronic Properties and Band Alignments in GaTe/C2N Heterostructure: a First-Principles Calculation

Recently, GaTe and C 2 N monolayers have been successfully synthesized and show fascinating electronic and optical properties. Such hybrid of GaTe with C 2 N may induce new novel physical properties. In this work, we perform ab initio simulations on the structural, electronic, and optical properties...

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Published inNanoscale research letters Vol. 13; no. 1; pp. 300 - 10
Main Authors Li, Xiao-Huan, Wang, Bao-Ji, Cai, Xiao-Lin, Yu, Wei-Yang, Zhu, Ying-Ying, Li, Feng-Yun, Fan, Rui-Xia, Zhang, Yan-Song, Ke, San-Huang
Format Journal Article
LanguageEnglish
Published New York Springer US 26.09.2018
Springer Nature B.V
SpringerOpen
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Summary:Recently, GaTe and C 2 N monolayers have been successfully synthesized and show fascinating electronic and optical properties. Such hybrid of GaTe with C 2 N may induce new novel physical properties. In this work, we perform ab initio simulations on the structural, electronic, and optical properties of the GaTe/C 2 N van der Waals (vdW) heterostructure. Our calculations show that the GaTe/C 2 N vdW heterostructure is an indirect-gap semiconductor with type-II band alignment, facilitating an effective separation of photogenerated carriers. Intriguingly, it also presents enhanced visible-UV light absorption compared to its components and can be tailored to be a good photocatalyst for water splitting at certain pH by applying vertical strains. Further, we explore specifically the adsorption and decomposition of water molecules on the surface of C 2 N layer in the heterostructure and the subsequent formation of hydrogen, which reveals the mechanism of photocatalytic hydrogen production on the 2D GaTe/C 2 N heterostructure. Moreover, it is found that in-plane biaxial strains can induce indirect-direct-indirect, semiconductor-metal, and type II to type I or type III transitions. These interesting results make the GaTe/C 2 N vdW heterostructure a promising candidate for applications in next generation of multifunctional optoelectronic devices.
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ISSN:1931-7573
1556-276X
DOI:10.1186/s11671-018-2708-x