The Effect of the Solution Flow and Electrical Field on the Homogeneity of Large-Scale Electrodeposited ZnO Nanorods

In this paper, we demonstrate the significant impact of the solution flow and electrical field on the homogeneity of large-scale ZnO nanorod electrodeposition from an aqueous solution containing zinc nitrate and ammonium nitrate, primarily based on the X-ray fluorescence results. The homogeneity can...

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Published inMaterials Vol. 17; no. 6; p. 1241
Main Authors Zhao, Yanmin, Li, Kexue, Hu, Ying, Hou, Xiaobing, Lin, Fengyuan, Tang, Jilong, Tang, Xin, Xing, Xida, Zhao, Xiao, Zhu, Haibin, Wang, Xiaohua, Wei, Zhipeng
Format Journal Article
LanguageEnglish
Published Switzerland MDPI AG 01.03.2024
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Summary:In this paper, we demonstrate the significant impact of the solution flow and electrical field on the homogeneity of large-scale ZnO nanorod electrodeposition from an aqueous solution containing zinc nitrate and ammonium nitrate, primarily based on the X-ray fluorescence results. The homogeneity can be enhanced by adjusting the counter electrode size and solution flow rate. We have successfully produced relatively uniform nanorod arrays on an 8 × 10 cm i-ZnO-coated fluorine-doped tin oxide (FTO) substrate using a compact counter electrode and a vertical stirring setup. The as-grown nanorods exhibit similar surface morphologies and dominant, intense, almost uniform near-band-edge emissions in different regions of the sample. Additionally, the surface reflectance is significantly reduced after depositing the ZnO nanorods, achieving a moth-eye effect through subwavelength structuring. This effect of the nanorod array structure indicates that it can improve the utilization efficiency of light reception or emission in various optoelectronic devices and products. The large-scale preparation of ZnO nanorods is more practical to apply and has an extremely broad application value. Based on the research results, it is feasible to prepare large-scale ZnO nanorods suitable for antireflective coatings and commercial applications by optimizing the electrodeposition conditions.
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ISSN:1996-1944
1996-1944
DOI:10.3390/ma17061241