Spatiotemporal patterning of photoresponsive DNA-based hydrogels to tune local cell responses

Understanding the spatiotemporal effects of surface topographies and modulated stiffness and anisotropic stresses of hydrogels on cell growth remains a biophysical challenge. Here we introduce the photolithographic patterning or two-photon laser scanning confocal microscopy patterning of a series of...

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Bibliographic Details
Published inNature communications Vol. 12; no. 1; p. 2364
Main Authors Huang, Fujian, Chen, Mengxi, Zhou, Zhixin, Duan, Ruilin, Xia, Fan, Willner, Itamar
Format Journal Article
LanguageEnglish
Published London Nature Publishing Group UK 22.04.2021
Nature Publishing Group
Nature Portfolio
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Summary:Understanding the spatiotemporal effects of surface topographies and modulated stiffness and anisotropic stresses of hydrogels on cell growth remains a biophysical challenge. Here we introduce the photolithographic patterning or two-photon laser scanning confocal microscopy patterning of a series of o-nitrobenzylphosphate ester nucleic acid-based polyacrylamide hydrogel films generating periodically-spaced circular patterned domains surrounded by continuous hydrogel matrices. The patterning processes lead to guided modulated stiffness differences between the patterned domains and the surrounding hydrogel matrices, and to the selective functionalization of sub-regions of the films with nucleic acid anchoring tethers. HeLa cells are deposited on the circularly-shaped domains functionalized with the MUC-1 aptamers. Initiation of the hybridization chain reaction by nucleic acid tethers associated with the continuous hydrogel matrix results in stress-induced ordered orthogonal shape-changes on the patterned domains, leading to ordered shapes of cell aggregates bound to the patterns. Spatiotemporal patterning of hydrogel matrices has been used to control cell behavior. Here the authors present photoresponsive DNA-based hydrogels and demonstrate patterning of physical and biochemical properties to tune local cell responses.
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ISSN:2041-1723
2041-1723
DOI:10.1038/s41467-021-22645-8