On-Site Fabrication of Crystalline Cerium Oxide Films and Patterns by Ink-Jet Deposition Method at Moderate Temperatures

• Published in: Journal of the American Ceramic Society Vol. 91; no. 7; pp. 2083 - 2087
• Main Authors: Gallage, Ruwan, Matsuo, Atsushi, Fujiwara, Takeshi, Watanabe, Tomoaki, Matsushita, Nobuhiro, Yoshimura, Masahiro
• Format: Journal Article
• Language: English
• Published: Malden, USA Blackwell Publishing Inc 01.07.2008; Blackwell; Wiley Subscription Services, Inc
• Subjects: Ceramics; Cerium oxide; Cracks; Cross-disciplinary physics: materials science; rheology; Crystal structure; Crystallites; Crystals; Deposition; Diffraction; Etching; Exact sciences and technology; Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids); Masking; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Nanostructure; Physics; Scanning electron microscopy; Temperature effects; Cerium Oxides; Scanning electron microscopy; Patterning; Inorganic compounds; Films; Thermogravimetry; Surfaces; Oxides; Differential thermal analysis; XRD; Experimental study; Morphology; Crystal growth from solutions; Ink jet printing
• ISSN: 0002-7820; 1551-2916
• DOI: 10.1111/j.1551-2916.2008.02402.x

Crystalline CeO2 films and patterns have been successfully fabricated in a “single‐step process” at moderate temperature. In this process, the combination of the ink‐jet technique and depositing the precursor on a hot substrate (≤300°C) gave crystalline CeO2 without further heat treatment. X‐ray diffraction analysis revealed that the phase formed was crystallized ceria with nanosized (<10 nm) crystallites. The film thickness was several hundred nanometers and the pattern width was about 150 μm. Scanning electron microscopy analysis showed that the films and patterns were free of cracks and adhered to the substrate. This is the first report about the direct patterning of crystalline CeO2 without postfiring or posttreatments like masking, etching, etc.