Antimicrobial activity of hydroxyl radicals generated by hydrogen peroxide photolysis against Streptococcus mutans biofilm
Highlights • Streptococcus mutans biofilm became up to 200 µm thick after 24 h of incubation. • S. mutans biofilm grown for over 6 h acquired antibiotic resistance. • Hydroxyl radicals generated by H2 O2 photolysis could kill bacteria in biofilm. • H2 O2 photolysis was effective both against biofilm...
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Published in | International journal of antimicrobial agents Vol. 48; no. 4; pp. 373 - 380 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Netherlands
Elsevier B.V
01.10.2016
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Subjects | |
Online Access | Get full text |
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Summary: | Highlights • Streptococcus mutans biofilm became up to 200 µm thick after 24 h of incubation. • S. mutans biofilm grown for over 6 h acquired antibiotic resistance. • Hydroxyl radicals generated by H2 O2 photolysis could kill bacteria in biofilm. • H2 O2 photolysis was effective both against biofilm and planktonic bacteria. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0924-8579 1872-7913 |
DOI: | 10.1016/j.ijantimicag.2016.06.007 |