Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer

The Neutralization layer for Directed self-assembly (DSA) was quickly formed by using polystyrene-polymethylmethacrylate random copolymer (PS-r-PMMA) immobilized by two different kinds of reactive self-assembled monolayers (SAMs). Two different kinds of reactive SAMs, one was photo-reactive and the...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 25; no. 1; pp. 73 - 76
Main Authors Hieno, Atsushi, Hattori, Shigeki, Nakamura, Hiroko, Asakawa, Koji, Seino, Yuriko, Kanno, Masahiro, Azuma, Tsukasa
Format Journal Article
LanguageEnglish
Published The Society of Photopolymer Science and Technology(SPST) 01.01.2012
Subjects
Annealing
Block Copolymer
Block copolymers
Copolymers
Covalence
Directed Self-Assembly
Neutralization Layer
Photopolymers
Quick Polymer Immobilization
Reactive Self-Assembled Monolayer
Self assembly
Self-assembled monolayers
Surface energy
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Summary:The Neutralization layer for Directed self-assembly (DSA) was quickly formed by using polystyrene-polymethylmethacrylate random copolymer (PS-r-PMMA) immobilized by two different kinds of reactive self-assembled monolayers (SAMs). Two different kinds of reactive SAMs, one was photo-reactive and the other was thermal reactive, were covalently bound to PS-r-PMMA by the photo exposure or thermal annealing, respectively. The surface energy for the neutralization layer was easily controlled by the composition ratio of PS-r-PMMA. The lamellar-forming PS-PMMA block copolymer was perpendicularly aligned on the neutralization layers.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.25.73