Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer
The Neutralization layer for Directed self-assembly (DSA) was quickly formed by using polystyrene-polymethylmethacrylate random copolymer (PS-r-PMMA) immobilized by two different kinds of reactive self-assembled monolayers (SAMs). Two different kinds of reactive SAMs, one was photo-reactive and the...
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Published in | Journal of Photopolymer Science and Technology Vol. 25; no. 1; pp. 73 - 76 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
The Society of Photopolymer Science and Technology(SPST)
01.01.2012
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Subjects | |
Online Access | Get full text |
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Summary: | The Neutralization layer for Directed self-assembly (DSA) was quickly formed by using polystyrene-polymethylmethacrylate random copolymer (PS-r-PMMA) immobilized by two different kinds of reactive self-assembled monolayers (SAMs). Two different kinds of reactive SAMs, one was photo-reactive and the other was thermal reactive, were covalently bound to PS-r-PMMA by the photo exposure or thermal annealing, respectively. The surface energy for the neutralization layer was easily controlled by the composition ratio of PS-r-PMMA. The lamellar-forming PS-PMMA block copolymer was perpendicularly aligned on the neutralization layers. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0914-9244 1349-6336 |
DOI: | 10.2494/photopolymer.25.73 |