Ionic Liquid for Directed Self-Assembly of PS-b-PMMA

The most widely studied block copolymer (BCP) for directed self-assembly (DSA) is poly(styrene-block-methyl methacrylate) (PS-b-PMMA). However PS-b-PMMA has a limitation of patterning size in sub-10 nm because the Flory-Huggins interaction parameter (χ) of PS-b-PMMA is approximately 0.038 at room te...

Full description

Saved in:
Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 29; no. 5; pp. 667 - 670
Main Authors Kawaue, Akiya, Matsumiya, Tasuku, Seo, Takehito, Maehashi, Takaya, Seshimo, Takehiro, Yamano, Hitoshi, Miyagi, Ken, Dazai, Takahiro, Chen, Xuanxuan, Rincon-Delgadillo, Paulina, Gronheid, Roel, Nealey, Paul F., Ohmori, Katsumi
Format Journal Article
LanguageEnglish
Japanese
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 01.01.2016
Japan Science and Technology Agency
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The most widely studied block copolymer (BCP) for directed self-assembly (DSA) is poly(styrene-block-methyl methacrylate) (PS-b-PMMA). However PS-b-PMMA has a limitation of patterning size in sub-10 nm because the Flory-Huggins interaction parameter (χ) of PS-b-PMMA is approximately 0.038 at room temperature. To obtain sub-10 nm patterning size, many high χ BCPs and systems have been studied. We investigate DSA of PS-b-PMMA with blended an ionic liquid (IL) via thermal annealing with free surface under nitrogen. L0 becomes larger than pure BCP by adding ILs in this system since χ parameter becomes higher. However there is a problem that long time (>30 min) and/or high temperature (>200 oC) annealing conditions causes L0 shrink than in mild annealing condition (200 oC /1 min). Here, we report IL design to prevent L0 shrink. The design of IL that we found in this study achieved less than 5 % L0 shrink at 215 oC for 30 min annealing.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.29.667