Photocuring of Radically Polymerizable Hyperbranched Polymers Having Degradable Linkages

Hyperbranched polymers having a number of reductive disulfide bonds and radically reactive vinyl groups were synthesized by the bulk radical homopolymerization of bis(2-methacryloyloxyethyl)disulfide (disulfide based dimethacrylate, DSDMA) as a divinyl monomer in the presence of methyl 2-(bromomethy...

Full description

Saved in:
Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 30; no. 2; pp. 241 - 246
Main Authors Sato, Eriko, Yamashita, Yoji, Nishiyama, Takashi, Horibe, Hideo
Format Journal Article
LanguageEnglish
Japanese
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 01.01.2017
Japan Science and Technology Agency
Subjects
Chain transfer
Corrosion resistance
Curable polymer
Degradable polymer
Hyperbranched polymer
Irradiation
Photo cleavage
Photocuring
Photopolymerization
Polymerization
Polymers
Reagents
Reductive decomposition
Solvents
Online AccessGet full text

Cover

More Information
Summary:Hyperbranched polymers having a number of reductive disulfide bonds and radically reactive vinyl groups were synthesized by the bulk radical homopolymerization of bis(2-methacryloyloxyethyl)disulfide (disulfide based dimethacrylate, DSDMA) as a divinyl monomer in the presence of methyl 2-(bromomethyl)acrylate as an addition-fragmentation chain transfer agent. The resulting hyperbranched polymers (HB-DSDMAs) were photocured by irradiated at 365 nm in the presence of 2,2-dimethoxy-2-phenylacetophenone as a photo radical initiator. The photocured HB-DSDMA exhibited high transparency in the visible region and good solvent resistance for various organic solvents. Reduction of the disulfide groups smoothly proceeded in the presence of tributylphosphine as a reductant, and the cured HB-DSDMAs were completely solubilized. HB-DSDMAs were also photocured by irradiation at 254 nm due to the homolysis of the disulfide groups with subsequent initiation of the radical polymerization.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.30.241