Shape control in wafer-based aperiodic 3D nanostructures

• Published in: Nanotechnology Vol. 25; no. 23; pp. 235302 - 7
• Main Authors: Jeong, Hyeon-Ho, Mark, Andrew G, Gibbs, John G, Reindl, Thomas, Waizmann, Ulrike, Weis, Jürgen, Fischer, Peer
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 13.06.2014; Institute of Physics
• Subjects: 3D nanofabrication; Applied sciences; Cleaning; Condensed matter: structure, mechanical and thermal properties; Cross sections; Cross-disciplinary physics: materials science; rheology; Deposition; electron beam lithography; Electronics; Exact sciences and technology; glancing angle deposition; Lithography; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties; Materials science; Methods of nanofabrication; Molecular electronics, nanoelectronics; Nanolithography; Nanostructure; Nanotechnology; physical vapour deposition; Physics; Seeds; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; shadow growth; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Three dimensional; Nanometer scale; Cross section; Lithography; Morphology; Wafers; Crystal seeds; Nanostructures; Cross sections; Nanoelectronics
• ISSN: 0957-4484; 1361-6528
• DOI: 10.1088/0957-4484/25/23/235302

Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate.