Localized heating on silicon field effect transistors: Device fabrication and temperature measurements in fluid
We demonstrate electrically addressable localized heating in fluid at the dielectric surface of silicon-on-insulator field-effect transistors via radio-frequency Joule heating of mobile ions in the Debye layer. Measurement of fluid temperatures in close vicinity to surfaces poses a challenge due to...
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Published in | Lab on a chip Vol. 9; no. 19; pp. 2789 - 2795 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
England
01.01.2009
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Subjects | |
Online Access | Get full text |
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Summary: | We demonstrate electrically addressable localized heating in fluid at the dielectric surface of silicon-on-insulator field-effect transistors via radio-frequency Joule heating of mobile ions in the Debye layer. Measurement of fluid temperatures in close vicinity to surfaces poses a challenge due to the localized nature of the temperature profile. To address this, we developed a localized thermometry technique based on the fluorescence decay rate of covalently attached fluorophores to extract the temperature within 2 nm of any oxide surface. We demonstrate precise spatial control of voltage dependent temperature profiles on the transistor surfaces. Our results introduce a new dimension to present sensing systems by enabling dual purpose silicon transistor-heaters that serve both as field effect sensors as well as temperature controllers that could perform localized bio-chemical reactions in Lab on Chip applications. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 ObjectType-Article-1 ObjectType-Feature-2 Authors have contributed equally Now at Intel Corporation, Santa Clara, CA. |
ISSN: | 1473-0197 1473-0189 |
DOI: | 10.1039/b906048k |