Recent Progress in Obtaining Semiconducting Single-Walled Carbon Nanotubes for Transistor Applications
High purity semiconducting single‐walled carbon nanotubes (s‐SWCNTs) with a narrow diameter distribution are required for high‐performance transistors. Achieving this goal is extremely challenging because the as‐grown material contains mixtures of s‐SWCNTs and metallic‐ (m‐) SWCNTs with wide diamete...
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Published in | Advanced materials (Weinheim) Vol. 27; no. 48; pp. 7908 - 7937 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Germany
Blackwell Publishing Ltd
22.12.2015
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Abstract | High purity semiconducting single‐walled carbon nanotubes (s‐SWCNTs) with a narrow diameter distribution are required for high‐performance transistors. Achieving this goal is extremely challenging because the as‐grown material contains mixtures of s‐SWCNTs and metallic‐ (m‐) SWCNTs with wide diameter distributions, typically inadequate for integrated circuits. Since 2000, numerous ex situ methods have been proposed to improve the purity of the s‐SWCNTs. The majority of these techniques fail to maintain the quality and integrity of the s‐SWCNTs with a few notable exceptions. Here, the progress in realizing high purity s‐SWCNTs in as‐grown and post‐processed materials is highlighted. A comparison of transistor parameters (such as on/off ratio and field‐effect mobility) obtained from test structures establishes the effectiveness of various methods and suggests opportunities for future improvements.
Advances in realizing high‐purity semiconducting single‐walled carbon nanotubes via in situ and ex situ approaches are reviewed. The utility of these techniques are compared with an emphasis on materials growth approaches and operational properties of transistors to assess the quality and purity of the resulting collections of nanotubes. |
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AbstractList | High purity semiconducting single-walled carbon nanotubes (s-SWCNTs) with a narrow diameter distribution are required for high-performance transistors. Achieving this goal is extremely challenging because the as-grown material contains mixtures of s-SWCNTs and metallic- (m-) SWCNTs with wide diameter distributions, typically inadequate for integrated circuits. Since 2000, numerous ex situ methods have been proposed to improve the purity of the s-SWCNTs. The majority of these techniques fail to maintain the quality and integrity of the s-SWCNTs with a few notable exceptions. Here, the progress in realizing high purity s-SWCNTs in as-grown and post-processed materials is highlighted. A comparison of transistor parameters (such as on/off ratio and field-effect mobility) obtained from test structures establishes the effectiveness of various methods and suggests opportunities for future improvements. High purity semiconducting single-walled carbon nanotubes (s-SWCNTs) with a narrow diameter distribution are required for high-performance transistors. Achieving this goal is extremely challenging because the as-grown material contains mixtures of s-SWCNTs and metallic- (m-) SWCNTs with wide diameter distributions, typically inadequate for integrated circuits. Since 2000, numerous ex situ methods have been proposed to improve the purity of the s-SWCNTs. The majority of these techniques fail to maintain the quality and integrity of the s-SWCNTs with a few notable exceptions. Here, the progress in realizing high purity s-SWCNTs in as-grown and post-processed materials is highlighted. A comparison of transistor parameters (such as on/off ratio and field-effect mobility) obtained from test structures establishes the effectiveness of various methods and suggests opportunities for future improvements. Advances in realizing high-purity semiconducting single-walled carbon nanotubes via in situ and ex situ approaches are reviewed. The utility of these techniques are compared with an emphasis on materials growth approaches and operational properties of transistors to assess the quality and purity of the resulting collections of nanotubes. High purity semiconducting single‐walled carbon nanotubes (s‐SWCNTs) with a narrow diameter distribution are required for high‐performance transistors. Achieving this goal is extremely challenging because the as‐grown material contains mixtures of s‐SWCNTs and metallic‐ (m‐) SWCNTs with wide diameter distributions, typically inadequate for integrated circuits. Since 2000, numerous ex situ methods have been proposed to improve the purity of the s‐SWCNTs. The majority of these techniques fail to maintain the quality and integrity of the s‐SWCNTs with a few notable exceptions. Here, the progress in realizing high purity s‐SWCNTs in as‐grown and post‐processed materials is highlighted. A comparison of transistor parameters (such as on/off ratio and field‐effect mobility) obtained from test structures establishes the effectiveness of various methods and suggests opportunities for future improvements. Advances in realizing high‐purity semiconducting single‐walled carbon nanotubes via in situ and ex situ approaches are reviewed. The utility of these techniques are compared with an emphasis on materials growth approaches and operational properties of transistors to assess the quality and purity of the resulting collections of nanotubes. |
Author | Islam, Ahmad E. Alam, Muhammad A. Rogers, John A. |
Author_xml | – sequence: 1 givenname: Ahmad E. surname: Islam fullname: Islam, Ahmad E. email: aeislam@ieee.org organization: Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, 45433, Dayton, OH, USA – sequence: 2 givenname: John A. surname: Rogers fullname: Rogers, John A. organization: Department of Materials Science and Engineering and Frederick Seitz Materials Research Laboratory, University of Illinois, IL, 61801, Urbana, USA – sequence: 3 givenname: Muhammad A. surname: Alam fullname: Alam, Muhammad A. organization: Department of Electrical and Computer Engineering, Purdue University West Lafayette, IN, 47907, USA |
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SSID | ssj0009606 |
Score | 2.4834037 |
Snippet | High purity semiconducting single‐walled carbon nanotubes (s‐SWCNTs) with a narrow diameter distribution are required for high‐performance transistors.... High purity semiconducting single-walled carbon nanotubes (s-SWCNTs) with a narrow diameter distribution are required for high-performance transistors.... |
SourceID | proquest crossref pubmed wiley istex |
SourceType | Aggregation Database Index Database Publisher |
StartPage | 7908 |
SubjectTerms | carbon nanotubes Collection field-effect mobility Integrated circuits Integrity on/off ratios on/off ratios, semiconducting purity Purity semiconducting purity Semiconductor devices Single wall carbon nanotubes transistor applications Transistors Utilities |
Title | Recent Progress in Obtaining Semiconducting Single-Walled Carbon Nanotubes for Transistor Applications |
URI | https://api.istex.fr/ark:/67375/WNG-C1WXPXCF-V/fulltext.pdf https://onlinelibrary.wiley.com/doi/abs/10.1002%2Fadma.201502918 https://www.ncbi.nlm.nih.gov/pubmed/26540144 https://search.proquest.com/docview/1760871825 https://search.proquest.com/docview/1800476149 |
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