Recent Progress in Obtaining Semiconducting Single-Walled Carbon Nanotubes for Transistor Applications
High purity semiconducting single‐walled carbon nanotubes (s‐SWCNTs) with a narrow diameter distribution are required for high‐performance transistors. Achieving this goal is extremely challenging because the as‐grown material contains mixtures of s‐SWCNTs and metallic‐ (m‐) SWCNTs with wide diamete...
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Published in | Advanced materials (Weinheim) Vol. 27; no. 48; pp. 7908 - 7937 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Germany
Blackwell Publishing Ltd
22.12.2015
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Subjects | |
Online Access | Get full text |
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Summary: | High purity semiconducting single‐walled carbon nanotubes (s‐SWCNTs) with a narrow diameter distribution are required for high‐performance transistors. Achieving this goal is extremely challenging because the as‐grown material contains mixtures of s‐SWCNTs and metallic‐ (m‐) SWCNTs with wide diameter distributions, typically inadequate for integrated circuits. Since 2000, numerous ex situ methods have been proposed to improve the purity of the s‐SWCNTs. The majority of these techniques fail to maintain the quality and integrity of the s‐SWCNTs with a few notable exceptions. Here, the progress in realizing high purity s‐SWCNTs in as‐grown and post‐processed materials is highlighted. A comparison of transistor parameters (such as on/off ratio and field‐effect mobility) obtained from test structures establishes the effectiveness of various methods and suggests opportunities for future improvements.
Advances in realizing high‐purity semiconducting single‐walled carbon nanotubes via in situ and ex situ approaches are reviewed. The utility of these techniques are compared with an emphasis on materials growth approaches and operational properties of transistors to assess the quality and purity of the resulting collections of nanotubes. |
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Bibliography: | ark:/67375/WNG-C1WXPXCF-V National Research Council and Air Force Office of Scientific Research istex:11828C25725F79E3E0F69E96B5591A3F0F715E47 ArticleID:ADMA201502918 ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0935-9648 1521-4095 |
DOI: | 10.1002/adma.201502918 |