Sub-5 nm Patterning by Directed Self-Assembly of Oligo(Dimethylsiloxane) Liquid Crystal Thin Films

Highly ordered nanopatterns are obtained at sub‐5 nm periodicities by the graphoepitaxial directed self‐assembly of monodisperse, oligo(dimethylsiloxane) liquid crystals. These hybrid organic/inorganic liquid crystals are of high interest for nanopatterning applications due to the combination of the...

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Bibliographic Details
Published inAdvanced materials (Weinheim) Vol. 28; no. 45; pp. 10068 - 10072
Main Authors Nickmans, Koen, Murphy, Jeffrey N., de Waal, Bas, Leclère, Philippe, Doise, Jan, Gronheid, Roel, Broer, Dick J., Schenning, Albertus P. H. J.
Format Journal Article
LanguageEnglish
Published Germany Blackwell Publishing Ltd 01.12.2016
Subjects
Annealing
directed self-assembly
graphoepitaxy
high-χ low-N
Liquid crystals
nanolithography
nanopatterning
Nanostructure
oligo(dimethylsiloxane)
Patterning
Self assembly
Thin films
oligo(dimethylsiloxane)
high-χ low-N
nanolithography
graphoepitaxy
directed self-assembly
nanopatterning
liquid crystals
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Summary:Highly ordered nanopatterns are obtained at sub‐5 nm periodicities by the graphoepitaxial directed self‐assembly of monodisperse, oligo(dimethylsiloxane) liquid crystals. These hybrid organic/inorganic liquid crystals are of high interest for nanopatterning applications due to the combination of their ultrasmall feature sizes and their ability to be directed into highly ordered domains without additional annealing.
Bibliography:istex:CEE5FF835837AF27A3D3FFE6FE44C1D059F0C1BB
Netherlands Organisation for Scientific Research
ArticleID:ADMA201602891
ark:/67375/WNG-2XQDKG0X-5
The copyright line for this article was changed on October 7, 2016 after original online publication
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SourceType-Scholarly Journals-1
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ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201602891