One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers

We report the self‐assembly of organic‐inorganic block copolymers (BCP) in thin‐films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size o...

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Bibliographic Details
Published inAdvanced materials (Weinheim) Vol. 21; no. 43; pp. 4334 - 4338
Main Authors Hirai, Tomoyasu, Leolukman, Melvina, Liu, Chi Chun, Han, Eungnak, Kim, Yun Jun, Ishida, Yoshihito, Hayakawa, Teruaki, Kakimoto, Masa-aki, Nealey, Paul F., Gopalan, Padma
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 20.11.2009
WILEY‐VCH Verlag
Subjects
block copolymer
high etching resistance
hybrid material
POSS
block copolymer
hybrid material
POSS
high etching resistance
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Summary:We report the self‐assembly of organic‐inorganic block copolymers (BCP) in thin‐films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.
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ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200900518