Single atom catalysts in Van der Waals gaps

Single-atom catalysts provide efficiently utilized active sites to improve catalytic activities while improving the stability and enhancing the activities to the level of their bulk metallic counterparts are grand challenges. Herein, we demonstrate a family of single-atom catalysts with different in...

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Published inNature communications Vol. 13; no. 1; pp. 6863 - 9
Main Authors Jiang, Huaning, Yang, Weiwei, Xu, Mingquan, Wang, Erqing, Wei, Yi, Liu, Wei, Gu, Xiaokang, Liu, Lixuan, Chen, Qian, Zhai, Pengbo, Zou, Xiaolong, Ajayan, Pulickel M., Zhou, Wu, Gong, Yongji
Format Journal Article
LanguageEnglish
Published London Nature Publishing Group UK 11.11.2022
Nature Publishing Group
Nature Portfolio
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Summary:Single-atom catalysts provide efficiently utilized active sites to improve catalytic activities while improving the stability and enhancing the activities to the level of their bulk metallic counterparts are grand challenges. Herein, we demonstrate a family of single-atom catalysts with different interaction types by confining metal single atoms into the van der Waals gap of two-dimensional SnS 2 . The relatively weak bonding between the noble metal single atoms and the host endows the single atoms with more intrinsic catalytic activity compared to the ones with strong chemical bonding, while the protection offered by the layered material leads to ultrahigh stability compared to the physically adsorbed single-atom catalysts on the surface. Specifically, the trace Pt-intercalated SnS 2 catalyst has superior long-term durability and comparable performance to that of commercial 10 wt% Pt/C catalyst in hydrogen evolution reaction. This work opens an avenue to explore high-performance intercalated single-atom electrocatalysts within various two-dimensional materials. A family of single-atom catalysts synthesized by intercalating metal single atoms into the van der Waals gap of two-dimensional SnS 2 is reported. The materials are applied as hydrogen evolving catalysts with good durability and overpotential.
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ISSN:2041-1723
2041-1723
DOI:10.1038/s41467-022-34572-3