Negative effective excitonic diffusion in monolayer transition metal dichalcogenides
While exciton relaxation in monolayers of transition metal dichalcogenides (TMDs) has been intensively studied, spatial exciton diffusion has received only a little attention - in spite of being a key process for optoelectronics and having already shown interesting unconventional behaviours ( e.g. s...
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Published in | Nanoscale Vol. 12; no. 1; pp. 356 - 363 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
England
Royal Society of Chemistry
07.01.2020
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Subjects | |
Online Access | Get full text |
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Summary: | While exciton relaxation in monolayers of transition metal dichalcogenides (TMDs) has been intensively studied, spatial exciton diffusion has received only a little attention - in spite of being a key process for optoelectronics and having already shown interesting unconventional behaviours (
e.g.
spatial halos). Here, we study the spatiotemporal dynamics in TMD monolayers and track optically excited excitons in time, momentum, and space. In particular, we investigate the temperature-dependent exciton diffusion including the remarkable exciton landscape constituted by bright and dark states. Based on a fully quantum mechanical approach, we show at low temperatures an unexpected
negative effective diffusion
characterized by a shrinking of the spatial exciton distributions. This phenomenon can be traced back to the existence of dark exciton states in TMD monolayers and is a result of an interplay between spatial exciton diffusion and intervalley exciton-phonon scattering.
The bright exciton propagation in monolayers of transition metal dichalcogenides (TMDs) shows at low temperatures a shrinking of the spatial profile,
i.e.
negative effective diffusion due to intervalley scattering in the TMDs excitonic landscape. |
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Bibliography: | Electronic supplementary information (ESI) available. See DOI 10.1039/C9NR07056G ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 2040-3364 2040-3372 2040-3372 |
DOI: | 10.1039/c9nr07056g |