Fabrication of Molecular Nanotemplates in Self-Assembled Monolayers by Extreme-Ultraviolet-Induced Chemical Lithography

• Published in: Small (Weinheim an der Bergstrasse, Germany) Vol. 3; no. 12; pp. 2114 - 2119
• Main Authors: Turchanin, Andrey, Schnietz, Mark, El-Desawy, Mohamed, Solak, Harun H., David, Christian, Gölzhäuser, Armin
• Format: Journal Article
• Language: English
• Published: Weinheim WILEY-VCH Verlag 03.12.2007; WILEY‐VCH Verlag
• Subjects: biomimetics; chemical nanopatterns; Chemistry Techniques, Analytical - methods; Microscopy, Atomic Force; molecular engineering; nanolithography; Nanostructures - radiation effects; Nanostructures - ultrastructure; Organophosphorus Compounds - chemistry; self-assembled monolayers; Spectrum Analysis; Thermodynamics; Ultraviolet Rays
• ISSN: 1613-6810; 1613-6829
• DOI: 10.1002/smll.200700516

Extreme‐UV interference lithography (EUV‐IL) is applied to create chemical nanopatterns in self‐assembled monolayers (SAMs) of 4′‐nitro‐1,1′‐biphenyl‐4‐thiol (NBPT) on gold. X‐ray photoelectron spectroscopy shows that EUV irradiation induces both the conversion of the terminal nitro groups of NBPT into amino groups and the lateral crosslinking of the underlying aromatic cores. Large‐area (≈2 mm2) nitro/amino chemical patterns with periods ranging from 2000 nm to 60 nm can be generated. Regions of pristine NBPT on the exposed samples are exchanged with protein‐resistant thiol SAMs of polyethyleneglycol, resulting in the formation of molecular nanotemplates, which can serve as the basis of complex biomimetic surfaces. The highly parallel fabrication of large‐area, periodic, molecular nanotemplates of alternating amino‐functionalized and protein‐repellent regions (see image) is shown. The approach is based on the combination of molecular self‐assembly and extreme‐UV‐interference‐induced chemical nanolithography. It presents a versatile tool for the generation of (bio)functional chemical nanopatterns on solids.