Synthesis of Ti–Al–Si–N nanocomposite films using liquid injection PECVD from alkoxide precursors

• Published in: Acta materialia Vol. 54; no. 8; pp. 2041 - 2048
• Main Authors: Li, Y.S., Shimada, S., Kiyono, H., Hirose, A.
• Format: Journal Article
• Language: English
• Published: Oxford Elsevier Ltd 01.05.2006; Elsevier Science
• Subjects: Alkoxide precursor; Applied sciences; Chemical vapor deposition; Corrosion; Corrosion environments; Exact sciences and technology; Intermetallic compounds; Metals. Metallurgy; Nanocomposite film; Nanocomposites; Nanomaterials; Nanostructure; Nitrides; Oxidation resistance; Plasma CVD; Scanning electron microscopy; Titanium; Ti–Al–Si–N; Alkoxide precursor; Oxidation resistance; Plasma CVD; Nanocomposite film; Ti–Al–Si–N; Ti-Al-Si-N; Plasma; Silicon nitride; Titanium nitride; Chemical vapor deposition; Composite material; Surface treatment; Corrosion resistance; Synthesis; Nanocomposite; Oxidation
• ISSN: 1359-6454; 1873-2453
• DOI: 10.1016/j.actamat.2005.12.034

A series of nitride films of the Ti–Al–Si system have been synthesized at about 750 °C using the liquid injection plasma-enhanced chemical vapor deposition technique from corresponding alkoxide precursors. The composition and structure of the films were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, and scanning and transmission electron microscopy. Amorphous SiN x and crystalline AlN and TiN films were formed in their individual cases, while the SiN x -containing (Ti/Al)Si–N composite films showed a two-phase microstructure consisting of amorphous SiN x matrix and embedded TiN, AlN, or TiAlN nanocrystals. The Si-rich nanocomposite films demonstrated superior high-temperature oxidation resistance. After two hours of air exposure at 900 °C, no elemental segregation was observed in the nitride films and their structures remained basically unaffected. The fundamental mechanism is discussed in terms of the chemically high inertness of amorphous SiN x interfacial phase and thereby the high thermal stability of the composite nitride films with unique nanostructures.