Bilayer graphene synthesis by plasma treatment of copper foils without using a carbon-containing gas

• Published in: Carbon (New York) Vol. 77; pp. 823 - 828
• Main Authors: Kato, Ryuichi, Tsugawa, Kazuo, Okigawa, Yuki, Ishihara, Masatou, Yamada, Takatoshi, Hasegawa, Masataka
• Format: Journal Article
• Language: English
• Published: Kidlington Elsevier Ltd 01.10.2014; Elsevier
• Subjects: Carbon; CHEMICAL VAPOR DEPOSITION; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Copper; Cross-disciplinary physics: materials science; rheology; Density; DEPOSITION; ELECTRICAL CONDUCTIVITY; Electrical resistivity; Exact sciences and technology; FOIL; Foils; Gold chloride; Graphene; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; PLASMAS; VAPOR DEPOSITION; Methane; Temperature dependence; Hydrogen; Plasma assisted processing; Foils; Carbon; Bilayer; Precipitation; Synthesis; Sheet resistivity; Graphene; Nucleation density; Copper; Bilayers
• ISSN: 0008-6223; 1873-3891
• DOI: 10.1016/j.carbon.2014.05.087

Bilayer graphene has been synthesized by using hydrogen plasma treatment of copper foils for 30s at the temperature of 850°C together with joule-heating treatment of the foils without using a carbon-containing gas such as methane in order to suppress the nucleation density of graphene. The effect of plasma provides active species of carbon atoms on copper substrate and a selective bilayer graphene formation of AB-stacking in a very short time. Carbon to be precipitated is delivered from the copper foil and/or the environment in the reaction chamber. The domain size of synthesized graphene, the controllability of a few layers and the electrical conductivity have been significantly improved compared with plasma chemical vapor deposition (CVD) using carbon-containing gas. The sheet resistance of bilayer graphene exhibits 951Ω in average. The carrier mobility shows 1000cm2/Vs in maximum at room temperature. The sheet resistance of 130±26Ω has been attained after the doping by gold chloride solution.