Improvement of multicrystalline silicon solar cells by a low temperature anneal after emitter diffusion
The influence of an annealing step at about 500 °C after emitter diffusion of multicrystalline solar cells is investigated. Neighboring wafers from a silicon ingot were processed using different annealing durations and temperatures. The efficiency of the cells was measured and detailed light beam in...
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Published in | Progress in photovoltaics Vol. 19; no. 2; pp. 165 - 169 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Chichester, UK
John Wiley & Sons, Ltd
01.03.2011
Wiley |
Subjects | |
Online Access | Get full text |
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Summary: | The influence of an annealing step at about 500 °C after emitter diffusion of multicrystalline solar cells is investigated. Neighboring wafers from a silicon ingot were processed using different annealing durations and temperatures. The efficiency of the cells was measured and detailed light beam induced current measurements were performed. These show that mainly areas with high contents of precipitates near the crucible walls are affected by the anneal. An efficiency increase from 14.5 to 15.4% by a 2 h anneal at 500 °C was observed. The effect seems to be more likely external than internal gettering. Copyright © 2010 John Wiley & Sons, Ltd.
An annealing step of 500 ‐ 600 °C for about 1 – 2 hours after phosphorus diffusion improves the border areas of multicrystalline silicon solar cells that were deteriorated from the crucible. Light beam induced current topograms indicate that the effect can be explained by phosphorus gettering. An efficiency increase from 14.5 % to 15.4 % by a 2 hour anneal at 500 °C was observed. |
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Bibliography: | ArticleID:PIP1002 ark:/67375/WNG-4T43CBRB-0 istex:CF983E3DE3C3B584360F632780707132D3D6E7C5 ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1062-7995 1099-159X 1099-159X |
DOI: | 10.1002/pip.1002 |