Self‐Templating Approaches to Hollow Nanostructures

• Published in: Advanced materials (Weinheim) Vol. 31; no. 38; pp. e1802349 - n/a
• Main Authors: Feng, Ji, Yin, Yadong
• Format: Journal Article
• Language: English
• Published: Germany Wiley Subscription Services, Inc 01.09.2019; Wiley
• Subjects: Chemistry; dissolution–regrowth; galvanic replacements; hollow nanostructures; Kirkendall effect; Materials Science; Nanostructure; Ostwald ripening; Physics; Route selection; Science & Technology - Other Topics; self‐templating; surface‐protected hollowing process; the Kirkendall effect; dissolution-regrowth; galvanic replacements; Ostwald ripening; self-templating; surface-protected hollowing process; the Kirkendall effect; hollow nanostructures
• ISSN: 0935-9648; 1521-4095
• DOI: 10.1002/adma.201802349

This current research progress on the fabrication of hollow nanostructures by using self‐templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self‐templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution–regrowth, and the surface‐protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented. Self‐templating approaches involving galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution–regrowth, and surface‐protected hollowing processes show advantages toward the synthesis of hollow nanoparticles, including high reproducibility, low production cost, and great dimensional control. Progress regarding these synthetic routes is discussed, followed by an outlook of the future development of this field.