Nucleation of fcc Ta when heating thin films

Thin tantalum films have been studied during in situ heating in a transmission electron microscope. Diffraction patterns from the as-deposited films were typical of amorphous materials. Crystalline grains were observed to form when the specimen was annealed in situ at 450°C. Particular attention was...

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Bibliographic Details
Published inScripta materialia Vol. 96; no. C; pp. 21 - 24
Main Authors Janish, Matthew T., Mook, William M., Carter, C. Barry
Format Journal Article
LanguageEnglish
Published United States Elsevier Ltd 01.02.2015
Elsevier
Subjects
Crystal structure
Face centered cubic lattice
Focused ion beam (FIB)
Formations
Grains
Heating
High-resolution electron microscopy (HREM)
MATERIALS SCIENCE
Nucleation
Tantalum
Thin films
Transmission electron microscopy (TEM)
Tantalum
Focused ion beam (FIB)
High-resolution electron microscopy (HREM)
Transmission electron microscopy (TEM)
Crystal structure
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Summary:Thin tantalum films have been studied during in situ heating in a transmission electron microscope. Diffraction patterns from the as-deposited films were typical of amorphous materials. Crystalline grains were observed to form when the specimen was annealed in situ at 450°C. Particular attention was addressed to the formation and growth of grains with the face-centered cubic (fcc) crystal structure. These observations are discussed in relation to prior work on the formation of fcc Ta by deformation and during thin film deposition.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
SAND-2014-16009J
AC04-94AL85000; DEAC04-94AL85000
USDOE National Nuclear Security Administration (NNSA)
ISSN:1359-6462
1872-8456
DOI:10.1016/j.scriptamat.2014.10.010