Study of the kinetics of step and flash imprint lithography photopolymerization
Step and Flash Imprint Lithography (SFIL) is a promising high‐resolution, yet low‐cost patterning technique that uses a UV induced photopolymerization to replicate features on a patterned template. The SFIL process utilizes an acrylate‐based free radical polymerization, which is inhibited by oxygen....
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Published in | AIChE journal Vol. 51; no. 9; pp. 2547 - 2555 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Hoboken
Wiley Subscription Services, Inc., A Wiley Company
01.09.2005
Wiley Subscription Services American Institute of Chemical Engineers |
Subjects | |
Online Access | Get full text |
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Summary: | Step and Flash Imprint Lithography (SFIL) is a promising high‐resolution, yet low‐cost patterning technique that uses a UV induced photopolymerization to replicate features on a patterned template. The SFIL process utilizes an acrylate‐based free radical polymerization, which is inhibited by oxygen. A semiempirical kinetic model is presented that demonstrates the effects of oxygen on SFIL. On the basis of kinetic measurements, dissolved oxygen causes an inhibition period at the onset of exposure that extends the required exposure time. Oxygen inhibition also results in a thin perimeter of under‐cured material surrounding the template due to oxygen diffusion from the ambient during polymerization. The model allows us to study the impact of oxygen on SFIL as a function of various formulation and exposure variables. Methods of limiting the impact of oxygen are presented, such as alternative chemistries and inerting techniques. © 2005 American Institute of Chemical Engineers AIChE J, 2005 |
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Bibliography: | NSF ArticleID:AIC10477 DARPA - No. N66001-01-1-8964 ark:/67375/WNG-1KVB7JQB-V istex:8C0D0E7EA4604690F140899EDBAD3EBD8181912A ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0001-1541 1547-5905 |
DOI: | 10.1002/aic.10477 |