Selective removal of Cs using copper ferrocyanide incorporated on organically functionalized silica supports

The formatted ethylenediamine functional group on silica supports gives the desired chelation with copper ferrocyanide for the selective removal of cesium ions. The copper ferrocyanide was well dispersed on the silica surface. Ion exchange capacity tests demonstrated that the functionalization of co...

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Published inJournal of radioanalytical and nuclear chemistry Vol. 303; no. 1; pp. 199 - 208
Main Authors Park, Younjin, Kim, Chorong, Choi, Sang-June
Format Journal Article
LanguageEnglish
Published Dordrecht Springer Netherlands 01.01.2015
Springer
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Summary:The formatted ethylenediamine functional group on silica supports gives the desired chelation with copper ferrocyanide for the selective removal of cesium ions. The copper ferrocyanide was well dispersed on the silica surface. Ion exchange capacity tests demonstrated that the functionalization of copper ferrocyanide on silica showed high rate of Cs removal. Loading of the organic functional group on silica at a rate of 30 % supported a high ion exchange capacity (0.92 mmol/g) for Cs ion. The sorption kinetics and the effect of co-existing salt on the efficiency of the composite material for Cs removal were also discussed.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0236-5731
1588-2780
DOI:10.1007/s10967-014-3337-1