Data set for fabrication of conformal two-dimensional TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H2O precursors

• Published in: Data in brief Vol. 13; pp. 401 - 407
• Main Authors: Zhuiykov, Serge, Akbari, Mohammad Karbalaei, Hai, Zhenyin, Xue, Chenyang, Xu, Hongyan, Hyde, Lachlan
• Format: Journal Article
• Language: English
• Published: Elsevier Inc 01.08.2017; Elsevier
• Subjects: Atomic layer deposition; Atomic-layered TiO2; Data; TDMAT precursor; Atomic layer deposition; Atomic-layered TiO2; TDMAT precursor
• ISSN: 2352-3409; 2352-3409
• DOI: 10.1016/j.dib.2017.06.013

The data and complementary information presented hare are related to the research article of “http://dx.doi.org/10.1016/j.matdes.2017.02.016; Materials and Design 120 (2017) 99–108” [1]. The article provides data and information on the case of atomic layer deposition (ALD) of ultra-thin two-dimensional TiO2 film. The chemical structure of precursors, and the fabrication process were illustrated. The data of spectral ellipsometric measurements and the methods of calculations were presented. Data of root mean square roughness and the average roughness of the ADL TiO2 film are presented. The method of bandgap measurements and the bandgap calculation are also explained in the present data article.