High quality Nb-based tunnel junctions for high frequency and digital applications

• Published in: IEEE transactions on applied superconductivity Vol. 13; no. 2; pp. 107 - 110
• Main Authors: Dmitriev, P.N., Lapitskaya, I.L., Filippenko, L.V., Ermakov, A.B., Shitov, S.V., Prokopenko, G.V., Kovtonyuk, S.A., Koshelets, V.P.
• Format: Journal Article
• Language: English
• Published: New York IEEE 01.06.2003; The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
• Subjects: Chemicals; Circuits; Current density; Electron beams; Fabrication; Frequency; Geometry; Josephson junctions; Lithography; Niobium
• ISSN: 1051-8223; 1558-2515
• DOI: 10.1109/TASC.2003.813657

A number of new fabrication techniques are developed and optimized in order to fit the requirements of contemporary superconducting electronics. To achieve ultimate performance of integrated submm receivers with operational frequency of 1 THz, tunnel junctions with AlN tunnel barrier having a R/sub n/S value as low as 1 /spl Omega//spl mu/m/sup 2/ have been developed. High quality characteristics of Nb/AlN/Nb tunnel junctions with R/sub j//R/sub n/=16 and R/sub n/S=10 /spl Omega//spl mu/m/sup 2/ have been demonstrated. Electron Beam Lithography (EBL) in combination with Chemical Mechanical Polishing (CMP) has been incorporated to produce Nb/AlN/Nb junctions with 0.03 /spl mu/m/sup 2/ area. A new approach to obtain overdamped Nb/AlO/sub x//Nb tunnel junctions has been proposed and realized. The dependencies of the main parameters of novel junctions on the current density and circuit geometry have been studied. These junctions may have a good potential in Josephson junction arrays and Single-Flux-Quantum applications (RSFQ).