Surface Optimization of Commercial Porous Ti Substrates by EPD of Titanium Nitride

• Published in: Membranes (Basel) Vol. 12; no. 5; p. 531
• Main Authors: Mortalò, Cecilia, Cannio, Maria, Zin, Valentina, Miorin, Enrico, Montagner, Francesco, Pasquali, Luca, Montecchi, Monica, Boccaccini, Dino Norberto, Fabrizio, Monica, Deambrosis, Silvia Maria
• Format: Journal Article
• Language: English
• Published: Switzerland MDPI AG 19.05.2022; MDPI
• Subjects: Aqueous solutions; Charged particles; Electrophoretic deposition; Fuel cells; High temperature; Hydrogen; multi-step EPD; Optimization; Permeability; Physical vapor deposition; Plasma sintering; Pore size; porous Ti substrates; Residual stress; Roughness; Solvents; Stainless steel; Substrates; Surface defects; Surface properties; Thermal mismatch; Thin films; Titanium; Titanium nitride; titanium nitride infiltration; multi-step EPD; porous Ti substrates; titanium nitride infiltration
• ISSN: 2077-0375; 2077-0375
• DOI: 10.3390/membranes12050531

In this work, the infiltration of TiN powders by electrophoretic deposition (EPD) in aqueous media was considered as alternative method to reduce the size craters and the roughness of commercial porous Ti substrates. Ti substrates can be used as suitable supports for the deposition of dense hydrogen separation TiNx-based membranes by physical vapor deposition (PVD) techniques. The influence of various EPD deposition parameters on surface morphology and roughness of TiN-infiltrated substrates were investigated in order to optimize their surface properties. The results suggest that a EPD procedure is an effective technique for reducing substrate surface defects of commercial porous Ti substrates which could then be successfully used as proper supports for the deposition of dense and defect-free TiNx layers, also aligning the thermal mismatch between the active layer and the porous substrate.