X-ray beam monitor made by thin-film CVD single-crystal diamond

A novel beam position monitor, operated at zero bias voltage, based on high‐quality chemical‐vapor‐deposition single‐crystal Schottky diamond for use under intense synchrotron X‐ray beams was fabricated and tested. The total thickness of the diamond thin‐film beam monitor is about 60 µm. The diamond...

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Bibliographic Details
Published inJournal of synchrotron radiation Vol. 19; no. 6; pp. 1015 - 1020
Main Authors Marinelli, Marco, Milani, E., Prestopino, G., Verona, C., Verona-Rinati, G., Angelone, M., Pillon, M., Kachkanov, V., Tartoni, N., Benetti, M., Cannatà, D., Di Pietrantonio, F.
Format Journal Article
LanguageEnglish
Published 5 Abbey Square, Chester, Cheshire CH1 2HU, England International Union of Crystallography 01.11.2012
John Wiley & Sons, Inc
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Summary:A novel beam position monitor, operated at zero bias voltage, based on high‐quality chemical‐vapor‐deposition single‐crystal Schottky diamond for use under intense synchrotron X‐ray beams was fabricated and tested. The total thickness of the diamond thin‐film beam monitor is about 60 µm. The diamond beam monitor was inserted in the B16 beamline of the Diamond Light Source synchrotron in Harwell (UK). The device was characterized under monochromatic high‐flux X‐ray beams from 6 to 20 keV and a micro‐focused 10 keV beam with a spot size of approximately 2 µm × 3 µm square. Time response, linearity and position sensitivity were investigated. Device response uniformity was measured by a raster scan of the diamond surface with the micro‐focused beam. Transmissivity and spectral responsivity versus beam energy were also measured, showing excellent performance of the new thin‐film single‐crystal diamond beam monitor.
Bibliography:ark:/67375/WNG-V25MMWN4-D
ArticleID:JSYWA5045
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content type line 23
ISSN:1600-5775
0909-0495
1600-5775
DOI:10.1107/S0909049512038186