X-ray beam monitor made by thin-film CVD single-crystal diamond
A novel beam position monitor, operated at zero bias voltage, based on high‐quality chemical‐vapor‐deposition single‐crystal Schottky diamond for use under intense synchrotron X‐ray beams was fabricated and tested. The total thickness of the diamond thin‐film beam monitor is about 60 µm. The diamond...
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Published in | Journal of synchrotron radiation Vol. 19; no. 6; pp. 1015 - 1020 |
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Main Authors | , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
5 Abbey Square, Chester, Cheshire CH1 2HU, England
International Union of Crystallography
01.11.2012
John Wiley & Sons, Inc |
Subjects | |
Online Access | Get full text |
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Summary: | A novel beam position monitor, operated at zero bias voltage, based on high‐quality chemical‐vapor‐deposition single‐crystal Schottky diamond for use under intense synchrotron X‐ray beams was fabricated and tested. The total thickness of the diamond thin‐film beam monitor is about 60 µm. The diamond beam monitor was inserted in the B16 beamline of the Diamond Light Source synchrotron in Harwell (UK). The device was characterized under monochromatic high‐flux X‐ray beams from 6 to 20 keV and a micro‐focused 10 keV beam with a spot size of approximately 2 µm × 3 µm square. Time response, linearity and position sensitivity were investigated. Device response uniformity was measured by a raster scan of the diamond surface with the micro‐focused beam. Transmissivity and spectral responsivity versus beam energy were also measured, showing excellent performance of the new thin‐film single‐crystal diamond beam monitor. |
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Bibliography: | ark:/67375/WNG-V25MMWN4-D ArticleID:JSYWA5045 istex:0C2AD83D2471CD9C17BBC0CCC3B753469C796867 ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1600-5775 0909-0495 1600-5775 |
DOI: | 10.1107/S0909049512038186 |