Photoinduced Radical Emission in a Coassembly System
Developing radical emission at ambient conditions is a challenging task since radical species are unstable in air. In the present work, we overcome this challenge by coassembling a series of tricarbonyl‐substituted benzene molecules with polyvinyl alcohol (PVA). The strong hydrogen bonds between the...
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Published in | Angewandte Chemie International Edition Vol. 60; no. 44; pp. 23842 - 23848 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Weinheim
Wiley Subscription Services, Inc
25.10.2021
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Edition | International ed. in English |
Subjects | |
Online Access | Get full text |
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Summary: | Developing radical emission at ambient conditions is a challenging task since radical species are unstable in air. In the present work, we overcome this challenge by coassembling a series of tricarbonyl‐substituted benzene molecules with polyvinyl alcohol (PVA). The strong hydrogen bonds between the guest dopants and the PVA host matrix protect the free radicals of carbonyl compounds after light irradiation, leading to strong solid state free radical emission. Changing temperature and peripheral functional groups of the tricarbonyl‐substituted benzenes can influence the intensity of the radical emission. Quantum‐chemical calculations predict that such free radical fluorescence originates from anti‐Kasha D2→D0 vertical emission by the anion radicals. The photoinduced radical emission by the tricarbonyl‐substituted benzenes was successfully utilized for information encryption application.
Coassembly systems are formed by doping carbonyl compounds into polyvinyl alcohol. After light irradiation the hydrogen‐bonding network stabilizes the free radicals generated for the carbonyl compounds, leading to strong free‐radical emission. Light/heat‐controlled information encryption using these systems is demonstrated. |
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Bibliography: | These authors contributed equally to this work. ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1433-7851 1521-3773 1521-3773 |
DOI: | 10.1002/anie.202110405 |