Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography

• Published in: Nanomaterials (Basel, Switzerland) Vol. 11; no. 11; p. 2949
• Main Authors: Vakarin, Vladyslav, Melati, Daniele, Dinh, Thi Thuy Duong, Le Roux, Xavier, Kan, Warren Kut King, Dupré, Cécilia, Szelag, Bertrand, Monfray, Stéphane, Boeuf, Frédéric, Cheben, Pavel, Cassan, Eric, Marris-Morini, Delphine, Vivien, Laurent, Alonso-Ramos, Carlos Alberto
• Format: Journal Article
• Language: English
• Published: Basel MDPI AG 01.11.2021; MDPI
• Subjects: Bandwidths; beam splitter; Electron beams; Fabrication; Immersion; Lithography; Material properties; metamaterial; Metamaterials; multi-mode interference coupler; Physics; Propagation; Silicon; silicon photonics; Simulation; Submerging; subwavelength grating; multi-mode interference coupler; metamaterial; silicon photonics; beam splitter
• ISSN: 2079-4991; 2079-4991
• DOI: 10.3390/nano11112949

Subwavelength grating (SWG) metamaterials have garnered a great interest for their singular capability to shape the material properties and the propagation of light, allowing the realization of devices with unprecedented performance. However, practical SWG implementations are limited by fabrication constraints, such as minimum feature size, that restrict the available design space or compromise compatibility with high-volume fabrication technologies. Indeed, most successful SWG realizations so far relied on electron-beam lithographic techniques, compromising the scalability of the approach. Here, we report the experimental demonstration of an SWG metamaterial engineered beam splitter fabricated with deep-ultraviolet immersion lithography in a 300-mm silicon-on-insulator technology. The metamaterial beam splitter exhibits high performance over a measured bandwidth exceeding 186 nm centered at 1550 nm. These results open a new route for the development of scalable silicon photonic circuits exploiting flexible metamaterial engineering.