Persistence of uranium groundwater plumes: Contrasting mechanisms at two DOE sites in the groundwater–river interaction zone

We examine subsurface uranium (U) plumes at two U.S. Department of Energy sites that are located near large river systems and are influenced by groundwater–river hydrologic interaction. Following surface excavation of contaminated materials, both sites were projected to naturally flush remnant urani...

Full description

Saved in:
Bibliographic Details
Published inJournal of contaminant hydrology Vol. 147; pp. 45 - 72
Main Authors Zachara, John M., Long, Philip E., Bargar, John, Davis, James A., Fox, Patricia, Fredrickson, Jim K., Freshley, Mark D., Konopka, Allan E., Liu, Chongxuan, McKinley, James P., Rockhold, Mark L., Williams, Kenneth H., Yabusaki, Steve B.
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier B.V 01.04.2013
Elsevier
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:We examine subsurface uranium (U) plumes at two U.S. Department of Energy sites that are located near large river systems and are influenced by groundwater–river hydrologic interaction. Following surface excavation of contaminated materials, both sites were projected to naturally flush remnant uranium contamination to levels below regulatory limits (e.g., 30μg/L or 0.126μmol/L; U.S. EPA drinking water standard), with 10years projected for the Hanford 300 Area (Columbia River) and 12years for the Rifle site (Colorado River). The rate of observed uranium decrease was much lower than expected at both sites. While uncertainty remains, a comparison of current understanding suggests that the two sites have common, but also different mechanisms controlling plume persistence. At the Hanford 300 A, the persistent source is adsorbed U(VI) in the vadose zone that is released to the aquifer during spring water table excursions. The release of U(VI) from the vadose zone and its transport within the oxic, coarse-textured aquifer sediments is dominated by kinetically-limited surface complexation. Modeling implies that annual plume discharge volumes to the Columbia River are small (<one pore volume). At the Rifle site, slow oxidation of naturally reduced, contaminant U(IV) in the saturated zone and a continuous influx of U(VI) from natural, up-gradient sources influence plume persistence. Rate-limited mass transfer and surface complexation also control U(VI) migration velocity in the sub-oxic Rifle groundwater. Flux of U(VI) from the vadose zone at the Rifle site may be locally important, but it is not the dominant process that sustains the plume. A wide range in microbiologic functional diversity exists at both sites. Strains of Geobacter and other metal reducing bacteria are present at low natural abundance that are capable of enzymatic U(VI) reduction in localized zones of accumulated detrital organic carbon or after organic carbon amendment. Major differences between the sites include the geochemical nature of residual, contaminant U; the rates of current kinetic processes (both biotic and abiotic) influencing U(VI) solid–liquid distribution; the presence of detrital organic matter and the resulting spatial heterogeneity in microbially-driven redox properties; and the magnitude of groundwater hydrologic dynamics controlled by river-stage fluctuations, geologic structures, and aquifer hydraulic properties. The comparative analysis of these sites provides important guidance to the characterization, understanding, modeling, and remediation of groundwater contaminant plumes influenced by surface water interaction that are common world-wide. ► Uranium plume persistence in connected groundwater–river systems ► Water table fluctuations can influence contaminant recharge to groundwater. ► Multiple factors control groundwater redox conditions and metal ion valence. ► River water intrusion affects aquifer surface complexation reactions.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0169-7722
1873-6009
DOI:10.1016/j.jconhyd.2013.02.001