High-Performance Short-Channel Double-Gate Low-Temperature Polysilicon Thin-Film Transistors Using Excimer Laser Crystallization

In this letter, high-performance low-temperature polysilicon thin-film transistors (TFTs) with double-gate (DG) structure and controlled lateral grain growth have been demonstrated by excimer laser crystallization. Via a proper excimer laser condition, along with the a-Si step height beside the bott...

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Bibliographic Details
Published inIEEE electron device letters Vol. 28; no. 11; pp. 1010 - 1013
Main Authors TSAI, Chun-Chien, WEI, Kai-Fang, LEE, Yao-Jen, CHEN, Hsu-Hsin, WANG, Jyh-Liang, LEE, I-Che, CHENG, Huang-Chung
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.11.2007
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:In this letter, high-performance low-temperature polysilicon thin-film transistors (TFTs) with double-gate (DG) structure and controlled lateral grain growth have been demonstrated by excimer laser crystallization. Via a proper excimer laser condition, along with the a-Si step height beside the bottom gate, a superlateral growth of Si was formed in the channel length plateau. Therefore, the DG TFTs with lateral silicon grains in the channel regions exhibited better current-voltage characteristics, as compared with the conventional top-gate ones. The proposed DG TFTs ( W / L = 1/1 mum) had the field-effect mobility exceeding 550 cm 2 /Vmiddots, an on/off current ratio that is higher than 10 8 , superior short-channel characteristics, and higher current drivability. In addition, the device-to-device uniformity could be improved since grain growth could be artificially controlled by the spatial plateau structure.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2007.908473