High Resolution Patterning of Functional Inks using Wettability and Repellency Control Method and Its Application to Electronic Devices

• Published in: Journal of Photopolymer Science and Technology Vol. 33; no. 4; pp. 381 - 386
• Main Authors: Hamaguchi, Hitoshi, Wada, Mitsuhiro, Yasuda, Hiroyuki, Kawaguchi, Kazuo, Ueda, Jirou, Kuriyama, Keisuke
• Format: Journal Article
• Language: English
• Published: Hiratsuka The Society of Photopolymer Science and Technology(SPST) 01.07.2020; Japan Science and Technology Agency
• Subjects: Electronic devices; High aspect patterning; High resolution; High resolution patterning; Inkjet printing; Inks; Microlens; Microlenses; Nanoparticles; Patterning; Photolithography; Printing; Self-patterning; Semiconductor devices; Silver; Thickness; Thin film transistors; Wettability; Wettability repellency Control
• ISSN: 0914-9244; 1349-6336
• DOI: 10.2494/photopolymer.33.381

High performance and easily processable wettable/repellent patterns formation were achieved using photo-induced surface control materials (PISC) by conventional i-line exposure and annealing. Functional inks can be patterned spontaneously on exposed surface which realize high resolution patterning by drop-coating methods. Fine silver lines of 10-μm width were achieved by inkjet printing with Ag nanoparticle (AgNP) inks on this pattern. Using this technique, silver source-drain electrodes of organic thin film transistor (OTFT) were successfully fabricated. A novel patterning method using alkali-developable type PISC was also devised for formation of high resolution, aspect patterns and high thickness microlenses, which difficult to be formed by photolithography technique.