Development of Cellulose Derivative Mold for Imprint Lithography

A cellulose derivative mold is used in imprint lithography and possesses great gas permeability. The gas permeable mold enables the minimization of the pattern failure caused by the accumulation of gas generated from imprinted material. This study aims to introduce a cellulose-based gas permeable mo...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 32; no. 1; pp. 131 - 136
Main Authors Kurematsu, Kazuho, Takei, Satoshi, Mizui, Kento, Hanabata, Makoto
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 24.06.2019
Japan Science and Technology Agency
Subjects
Cellulose
Cellulose derivatives
Cellulosic resins
Contact angle
Corrosion resistance
Gas permeable mold
Imprint lithography
Lithography
Molds
Patterning
Permeability
Polydimethylsiloxane silicon elastomer
Reproducibility
Solvents
Ultrasonic testing
Ultraviolet radiation
Volatile solvent
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Summary:A cellulose derivative mold is used in imprint lithography and possesses great gas permeability. The gas permeable mold enables the minimization of the pattern failure caused by the accumulation of gas generated from imprinted material. This study aims to introduce a cellulose-based gas permeable mold for patterning UV-curable resin containing a volatile solvent. The measurement of the contact angles of the mold surface, dissolution test for the volatile solvent, and imprint lithography showed that the gas permeable mold has great imprinting repeatability and solvent resistance. We expect that imprint lithography using the gas permeable mold derived from the cellulose and materials containing volatile solvent will enable pattern failure reduction, repeatable imprinting, and decrease in the viscosity of the imprinted material.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.32.131