Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution

A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of L. by 35-44%, and the diameter of the roo...

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Published inPlants (Basel) Vol. 11; no. 10; p. 1373
Main Authors Konchekov, Evgeny M, Kolik, Leonid V, Danilejko, Yury K, Belov, Sergey V, Artem'ev, Konstantin V, Astashev, Maxim E, Pavlik, Tatiana I, Lukanin, Vladimir I, Kutyrev, Alexey I, Smirnov, Igor G, Gudkov, Sergey V
Format Journal Article
LanguageEnglish
Published Switzerland MDPI AG 22.05.2022
MDPI
Subjects
Aqueous solutions
Chemical reactions
Cold plasmas
Dielectric barrier discharge
Electrical resistivity
Grafting
Medical research
Nitrogen
pear
Plasma
plasma-activated water
Pyrus communis L
reactive nitrogen species
reactive oxygen species
Silicones
Sucrose
Vascular system
Pyrus communis L
plasma-activated water
reactive nitrogen species
pear
reactive oxygen species
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Abstract A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of L. by 35-44%, and the diameter of the root collar by 10-28%. In this case, the electrical resistivity of the graft decreased by 20-48%, which indicated the formation of a more developed vascular system at the rootstock-scion interface. The characteristics of DBD CAP and PTS are described in detail.
AbstractList A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of Pyrus communis L. by 35–44%, and the diameter of the root collar by 10–28%. In this case, the electrical resistivity of the graft decreased by 20–48%, which indicated the formation of a more developed vascular system at the rootstock–scion interface. The characteristics of DBD CAP and PTS are described in detail.
A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of Pyrus communis L. by 35–44%, and the diameter of the root collar by 10–28%. In this case, the electrical resistivity of the graft decreased by 20–48%, which indicated the formation of a more developed vascular system at the rootstock–scion interface. The characteristics of DBD CAP and PTS are described in detail.
A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of L. by 35-44%, and the diameter of the root collar by 10-28%. In this case, the electrical resistivity of the graft decreased by 20-48%, which indicated the formation of a more developed vascular system at the rootstock-scion interface. The characteristics of DBD CAP and PTS are described in detail.
Author Astashev, Maxim E
Artem'ev, Konstantin V
Belov, Sergey V
Kutyrev, Alexey I
Kolik, Leonid V
Pavlik, Tatiana I
Konchekov, Evgeny M
Gudkov, Sergey V
Lukanin, Vladimir I
Danilejko, Yury K
Smirnov, Igor G
AuthorAffiliation 1 Prokhorov General Physics Institute of the Russian Academy of Sciences, 119991 Moscow, Russia; leonidkolik@mail.ru (L.V.K.); dyuk42@list.ru (Y.K.D.); ser79841825@yandex.ru (S.V.B.); artemievkv@mail.ru (K.V.A.); astashev.max@gmail.com (M.E.A.); ti.pavlik.u@gmail.com (T.I.P.); vladimirlukanin@yandex.ru (V.I.L.); s_makariy@rambler.ru (S.V.G.)
2 Federal Scientific Agroengineering Center VIM, 109428 Moscow, Russia; alexeykutyrev@gmail.com (A.I.K.); rashn-smirnov@yandex.ru (I.G.S.)
AuthorAffiliation_xml – name: 2 Federal Scientific Agroengineering Center VIM, 109428 Moscow, Russia; alexeykutyrev@gmail.com (A.I.K.); rashn-smirnov@yandex.ru (I.G.S.)
– name: 1 Prokhorov General Physics Institute of the Russian Academy of Sciences, 119991 Moscow, Russia; leonidkolik@mail.ru (L.V.K.); dyuk42@list.ru (Y.K.D.); ser79841825@yandex.ru (S.V.B.); artemievkv@mail.ru (K.V.A.); astashev.max@gmail.com (M.E.A.); ti.pavlik.u@gmail.com (T.I.P.); vladimirlukanin@yandex.ru (V.I.L.); s_makariy@rambler.ru (S.V.G.)
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BackLink https://www.ncbi.nlm.nih.gov/pubmed/35631800$$D View this record in MEDLINE/PubMed
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Keywords Pyrus communis L
plasma-activated water
reactive nitrogen species
pear
reactive oxygen species
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Snippet A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP...
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SubjectTerms Aqueous solutions
Chemical reactions
Cold plasmas
Dielectric barrier discharge
Electrical resistivity
Grafting
Medical research
Nitrogen
pear
Plasma
plasma-activated water
Pyrus communis L
reactive nitrogen species
reactive oxygen species
Silicones
Sucrose
Vascular system
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Title Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution
URI https://www.ncbi.nlm.nih.gov/pubmed/35631800
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