Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution

• Published in: Plants (Basel) Vol. 11; no. 10; p. 1373
• Main Authors: Konchekov, Evgeny M, Kolik, Leonid V, Danilejko, Yury K, Belov, Sergey V, Artem'ev, Konstantin V, Astashev, Maxim E, Pavlik, Tatiana I, Lukanin, Vladimir I, Kutyrev, Alexey I, Smirnov, Igor G, Gudkov, Sergey V
• Format: Journal Article
• Language: English
• Published: Switzerland MDPI AG 22.05.2022; MDPI
• Subjects: Aqueous solutions; Chemical reactions; Cold plasmas; Dielectric barrier discharge; Electrical resistivity; Grafting; Medical research; Nitrogen; pear; Plasma; plasma-activated water; Pyrus communis L; reactive nitrogen species; reactive oxygen species; Silicones; Sucrose; Vascular system; Pyrus communis L; plasma-activated water; reactive nitrogen species; pear; reactive oxygen species
• ISSN: 2223-7747; 2223-7747
• DOI: 10.3390/plants11101373

A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of L. by 35-44%, and the diameter of the root collar by 10-28%. In this case, the electrical resistivity of the graft decreased by 20-48%, which indicated the formation of a more developed vascular system at the rootstock-scion interface. The characteristics of DBD CAP and PTS are described in detail.