Fabrication of add-drop filters based on frequency-matched microring resonators

Frequency mismatches between resonators significantly impact the spectral responses of coupled resonator filters, such as high-order microring filters. In this paper, techniques allowing fabrication of frequency-matched high-index-contrast resonators are proposed, demonstrated, and analyzed. The mai...

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Bibliographic Details
Published inJournal of lightwave technology Vol. 24; no. 5; pp. 2207 - 2218
Main Authors Barwicz, T., Popovic, M.A., Watts, M.R., Rakich, P.T., Ippen, E.P., Smith, H.I.
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.05.2006
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:Frequency mismatches between resonators significantly impact the spectral responses of coupled resonator filters, such as high-order microring filters. In this paper, techniques allowing fabrication of frequency-matched high-index-contrast resonators are proposed, demonstrated, and analyzed. The main approach consists of inducing small dimensional changes in the resonators through alteration of the electron-beam dose used to expose either the actual resonator on a wafer or its image on a lithographic mask to be later used in filter fabrication. Third-order microring filters fabricated in silicon-rich silicon nitride, with optical resonator frequencies matched to better than 1 GHz, are reported. To achieve this, the average ring-waveguide widths of the microrings are matched to within less than 26 pm of a desired relative width offset. Furthermore, optimization and calibration procedures allowing strict dimensional control and smooth sidewalls are presented. A 5-nm dimensional control is demonstrated, and the standard deviation of sidewall roughness is reduced to below 1.6 nm.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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content type line 23
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2006.872298