Synthesis of superhydrophobic silicon oxide nanowires surface on silicon wafer

High roughness of several hundreds of nanometers and low free energy introduced the superhydrophobic surface with a high water contact angle of approximatelt 160 degrees for the chemically modified silicon oxide nanowires on silicon wafer. Particularly, a very small rolling angle of < 5 degrees w...

Full description

Saved in:
Bibliographic Details
Published inJournal of nanoscience and nanotechnology Vol. 9; no. 3; p. 1819
Main Authors Niu, Jun Jie, Wang, Jian Nong, Xu, Qian Feng
Format Journal Article
LanguageEnglish
Published United States 01.03.2009
Online AccessGet more information

Cover

More Information
Summary:High roughness of several hundreds of nanometers and low free energy introduced the superhydrophobic surface with a high water contact angle of approximatelt 160 degrees for the chemically modified silicon oxide nanowires on silicon wafer. Particularly, a very small rolling angle of < 5 degrees with the annealed sample was observed. The nano-structure with high roughness and organic perfluoroalkysilane coating with CF2/CF3 groups contributed the superhydrophobicity. The present superhydrophobic nanowires surface on silicon wafer suggests the potential applications in self-cleaning semiconductor devices such as radar surface, solar cell.
ISSN:1533-4880
DOI:10.1166/jnn.2009.371