Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography

A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion....

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Bibliographic Details
Published inElectronics letters Vol. 49; no. 22; pp. 1401 - 1402
Main Authors Okayama, H, Shimura, D, Onawa, Y, Takahashi, H, Seki, M, Koshino, K, Yokoyama, N, Oshtsuka, M, Tsuchizawa, T, Nishi, H, Yamada, K, Yaegashi, H, Horikawa, T, Sasaki, H
Format Journal Article
LanguageEnglish
Published Stevenage The Institution of Engineering and Technology 24.10.2013
Institution of Engineering and Technology
John Wiley & Sons, Inc
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Summary:A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of −23 dB was obtained.
Bibliography:H. Okayama, D. Shimura, Y. Onawa, H. Takahashi and H. Yaegshi: Also with the Oki Electric Industry Co. Ltd., 1‐16‐8, Chuou, Warabi, Saitama 335‐8510, Japan
M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka and T. Horikawa: Also with the National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki 305‐8569, Japan
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SourceType-Scholarly Journals-1
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content type line 23
ISSN:0013-5194
1350-911X
1350-911X
DOI:10.1049/el.2013.2979