Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography
A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion....
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Published in | Electronics letters Vol. 49; no. 22; pp. 1401 - 1402 |
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Main Authors | , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Stevenage
The Institution of Engineering and Technology
24.10.2013
Institution of Engineering and Technology John Wiley & Sons, Inc |
Subjects | |
Online Access | Get full text |
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Summary: | A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of −23 dB was obtained. |
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Bibliography: | H. Okayama, D. Shimura, Y. Onawa, H. Takahashi and H. Yaegshi: Also with the Oki Electric Industry Co. Ltd., 1‐16‐8, Chuou, Warabi, Saitama 335‐8510, Japan M. Seki, K. Koshino, N. Yokoyama, M. Ohtsuka and T. Horikawa: Also with the National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki 305‐8569, Japan ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0013-5194 1350-911X 1350-911X |
DOI: | 10.1049/el.2013.2979 |